[Newspaper] Press for our research achievement of IEEE Symposium on VLSI Technology and Circuits

<Newspaper Articles for Our Research Achievements – “High-Performance Monolithic 3D CMOS Enabled by Orientation-Aligned Seedless Laser Crystallization and Ultra-Shallow Laser Activation”>

• e4ds news “Solving the 3D Stacked Semiconductor Challenge of ‘Thermal Limit’ (2025.05.09)“
• Our research team has succeeded in overcoming the limitations of the heat treatment process, which was a difficult problem in next-generation semiconductor technology, and in developing an innovative technology using lasers, thereby dramatically improving semiconductor performance.
• The results of this study are scheduled (June 12, Thursday, 15:15-15:40 / Gate Stack and BEOL Transistor Processes: T19-4) to be presented at the ‘IEEE Symposium on VLSI Technology 2025’, the most prestigious academic conference in the field of semiconductor devices.
• The VLSI Technology Symposium, along with the International Electron Devices and Engineering (IEDM), is considered an authoritative conference where only the highest level of research is presented.