[Patent] Korean Patent Pending (Application No. 2023-0196020)
[Patent] Korean Patent Pending (Application No. 2023-0196020)
3rd January 2024
<Korean Patent Pending>
Title: “N-type Dopant Doping Method and N-type Dopant-Doped Substrate Manufactured using the Same, Method of Manufacturing a Transistor using the Same, and Transistor Including the Same”