[Published Paper] IEEE Access 20th September 2020 <Published Paper – IEEE Access> Authors: Seunghun Baik, Dong-Jae Kwon, Hongki Kang, Jae Eun Jang, Jaewon Jang, Y.S. Kim**, and Hyuk-Jun Kwon** Title: “Conformal and Ultra-Shallow Junction Formation Achieved using a Pulsed-Laser Annealing Process Integrated with a Modified Plasma Assisted Doping Method” Journal: IEEE Access (IF: 4.098, 85.48%, JCR 2018Y) Volume: 8 Pages: 172166-172174 From Media
